首页> 外文期刊>Journal of Polymer Science, Part B. Polymer Physics >Acrylic acid level and adhesive performance and peel master-curves of acrylic pressure-sensitive adhesives
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Acrylic acid level and adhesive performance and peel master-curves of acrylic pressure-sensitive adhesives

机译:丙烯酸压敏胶的丙烯酸含量和胶粘剂性能以及剥离主曲线

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Three series of pressure-sensitive adhesives were prepared with constant glass-transition temperature, using emulsion polymerization. The monomers chosen were butyl acrylate, 2-ethylhexyl acrylate (EHA), methyl methacrylate (MMA), and acrylic acid (AA). Within each polymer series, the proportion of AA monomer was held constant for each polymer preparation but acrylic ester monomer levels were varied. Adhesion performance was assessed by measurement of loop tack, static shear resistance, and through the construction of peel master-curves. Peel master-curves were generated through peel tests conducted over a range of temperatures and peel rates and through application of the time-temperature superposition principle. Bulk effects dominated by polymer zero shear viscosity change as AA and EHA levels were varied were attributed to the observed effect on static shear resistance and the horizontal displacements of peel master-curves. Static shear resistance was found to strongly correlate with log(a(C)), a parameter introduced to horizontally shift peel master-curves to form a superposed, "super master-curve". An interfacial interaction was proposed to account for deviations observed when loop tack was correlated with log(a(C)). Surface rearrangements via hydrogen bonding with the test substrate were suggested as responsible for the interfacial interaction. (c) 2006 Wiley Periodicals, Inc.
机译:使用乳液聚合在恒定的玻璃化转变温度下制备了三组压敏胶粘剂。选择的单体是丙烯酸丁酯,丙烯酸2-乙基己酯(EHA),甲基丙烯酸甲酯(MMA)和丙烯酸(AA)。在每个聚合物系列中,对于每种聚合物制备,AA单体的比例保持恒定,但丙烯酸酯单体的含量却有所不同。通过测量毛圈粘性,抗静态剪切性以及通过构造剥离母曲线来评估粘合性能。剥离母曲线是通过在一定温度和剥离速率下进行的剥离测试,以及通过应用时间-温度叠加原理而产生的。随着AA和EHA含量的变化,聚合物零剪切粘度变化占主导的整体效应归因于观察到的对静态抗剪切力和剥离主曲线水平位移的影响。发现静态抗剪切力与log(a(C))紧密相关,log(a(C))是引入的参数,用于水平移动果皮主曲线以形成叠加的“超级主曲线”。提出了一种界面相互作用来解决当回路定位与log(a(C))相关时观察到的偏差。建议通过氢键与测试基材的表面重排是界面相互作用的原因。 (c)2006年Wiley Periodicals,Inc.

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