首页> 外文期刊>Journal of Polymer Science, Part A. Polymer Chemistry >Radical copolymerization of 2-trifluoromethylacrylic monomers. III. Kinetics and monomer reactivities in the copolymerization of t-butyl 2-trifluoromethylacrylate and methacrylate with styrene bearing hexafluoroisopropanol
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Radical copolymerization of 2-trifluoromethylacrylic monomers. III. Kinetics and monomer reactivities in the copolymerization of t-butyl 2-trifluoromethylacrylate and methacrylate with styrene bearing hexafluoroisopropanol

机译:2-三氟甲基丙烯酸单体的自由基共聚。三, 2-三氟甲基丙烯酸叔丁酯和甲基丙烯酸酯与含六氟异丙醇的苯乙烯共聚的动力学和单体反应性

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Radical copolymerizations of t-butyl 2-trifluoromethylacrylate (TBTFMA) and styrene-bearing hexafluoroisopropanol [4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene (STHFA) with 2,2'-azobisisobutyronitrile were investigated in detail through the analysis of the kinetics in situ with H-1 NMR and through the determination of the monomer reactivity ratios. TBTFMA incorporation was less than 50 mol % unless its concentration in the feed was greater than 90 mol %. Furthermore, the penultimate model provided a better description of the TBTFMA-STHFA copolymerization. In contrast, t-butyl methacrylate copolymerized with STHFA according to the terminal model. The copolymerizations were simulated on the basis of the monomer reactivity ratios to calculate the feed and copolymer composition changes, sequence distributions, and so forth as a function of the initial feed ratio and conversion. The simulation results showed excellent agreement with the kinetic data. The copolymers described in this article were evaluated as chemical amplification resist polymers for the emerging field of 157-nm lithography. (C) 2004 Wiley Periodicals, Inc. [References: 25]
机译:叔丁基-2-三氟甲基丙烯酸酯(TBTFMA)与含苯乙烯的六氟异丙醇[4-(1,1,1,3,3,3-六氟-2-羟丙基)-苯乙烯(STHFA)与2,2'-的自由基共聚偶氮二异丁腈通过H-1 NMR原位动力学分析和单体反应比的确定进行了详细研究。除非进料中TBTFMA的浓度大于90mol%,否则TBTFMA掺入小于50mol%。此外,倒数第二个模型为TBTFMA-STHFA共聚提供了更好的描述。相反,根据末端模型,甲基丙烯酸叔丁酯与STHFA共聚。基于单体反应性比率模拟共聚,以计算进料和共聚物组成的变化,序列分布等作为初始进料比率和转化率的函数。仿真结果与动力学数据吻合良好。本文所述的共聚物在新兴的157 nm光刻领域中被评估为化学放大抗蚀剂聚合物。 (C)2004 Wiley Periodicals,Inc. [参考:25]

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