首页> 外文期刊>Journal of Polymer Research >Effects of various polymer brushes on the crystallization of poly(ethylene glycol) in poly(ethylene glycol)-b-polystyrene and poly(ethylene glycol)-b-poly(methyl methacrylate) single crystals
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Effects of various polymer brushes on the crystallization of poly(ethylene glycol) in poly(ethylene glycol)-b-polystyrene and poly(ethylene glycol)-b-poly(methyl methacrylate) single crystals

机译:各种聚合物刷对聚乙二醇-b-聚苯乙烯和聚乙二醇-b-聚甲基丙烯酸甲酯单晶中聚乙二醇结晶的影响

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摘要

The effects of PS and PMMA brushes on the crystallization of PEG in poly(ethylene glycol)-block-polystyrene (PEG-b-PS) and poly(ethylene glycol)-block-poly(methyl methacrylate) (PEG-b-PMMA) single crystals that have the same crystalline block molecular weight but different amorphous block molecular weights were investigated. The quality of the solvent (amyl acetate) employed and the interaction of the single-crystal substrate with the brush were found to influence the conformations of the PS and PMMA brushes, leading to more extended and packed pancake conformations, respectively. For PS and PMMAbrushes with similar features, the conformation of the PMMA brushes led to a higher osmotic pressure on the substrate, so the substrate thickness was found to be significantly less than that seen when PS brushes were used. Even when the molecular weight of PMMA (M_n=8,700 g/mol) is considerably lower than that of PS (M_n=14,800 g/mol), the substrate in the presence of PMMA is thinner than that in the presence of PS (3.65 vs. 4.14 nm). Moreover, because there is less entropic repulsion between PS brushes than between PMMA brushes, the thickening of the substrate chains beneath them was more conspicuous when the crystallization temperature was increased.
机译:PS和PMMA刷对PEG在聚乙二醇嵌段聚苯乙烯(PEG-b-PS)和聚乙二醇嵌段聚甲基丙烯酸甲酯(PEG-b-PMMA)中结晶的影响研究了具有相同晶体嵌段分子量但具有不同无定形嵌段分子量的单晶。发现使用的溶剂(乙酸戊酯)的质量以及单晶基材与刷子的相互作用会影响PS和PMMA刷子的构型,分别导致更扩展和更紧密的煎饼结构。对于具有相似特征的PS和PMMA刷子,PMMA刷子的构造导致基材上的渗透压更高,因此发现基材厚度明显小于使用PS刷子时的厚度。即使当PMMA的分子量(M_n = 8,700 g / mol)大大低于PS的分子量(M_n = 14,800 g / mol)时,在存在PMMA的情况下,基材也比在PS存在的情况下薄(3.65 vs 4.14 nm)。此外,由于PS刷之间的排斥力比PMMA刷之间的排斥力小,所以当结晶温度升高时,它们下方的底物链的增厚更加明显。

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