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Electrical and optical properties of p-GaN films implanted with transition metal impurities

机译:注入过渡金属杂质的p-GaN薄膜的电学和光学性质

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Electrical and optical properties and the spectra of deep hole traps in p-GaN films implanted with high doses (3 x 10(16) cm(-3)) of Co, Mn, Fe and Cr and annealed at 700degreesC are reported. The dominant deep traps generated by this implantation are of the same type as observed in similar films heavily implanted with protons. The magnitude of the changes in the conductance and transmission of the GaN Correlates with the atomic mass of the transition metal ions and the density of primary radiation defects. For fabrication of spintronic devices such as spin-LEDs using implantation of the TM species into the top p-GaN contact layer, the best results should be expected using Cr implantation since this produces both room temperature ferromagnetism and the smallest reduction in conductivity of the p-GaN.
机译:据报道,在p-GaN薄膜中注入了高剂量(3 x 10(16)cm(-3))的Co,Mn,Fe和Cr,并在7​​00℃退火后,其电学和光学特性以及深空穴阱的光谱得到了报道。通过这种注入产生的主要深陷阱与在大量注入质子的类似薄膜中观察到的类型相同。 GaN的电导率和透射率变化的幅度与过渡金属离子的原子质量和一次辐射缺陷的密度相关。对于将TM物种注入顶部p-GaN接触层的自旋电子器件(例如自旋LED)的制造,使用Cr注入应可预期获得最佳结果,因为这会产生室温铁磁性和p导电率的最小降低-氮化镓

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