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Optical and structural characterization of self-organized stacked GaN/AlN quantum dots

机译:自组织堆叠式GaN / AlN量子点的光学和结构表征

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Self-organized GaN/AlN stacked quantum dots (QDs) have been studied by means of cathodoluminescence (CL), near field scanning optical microscopy (NSOM), photoluminescence, mu-Raman, and transmission electron microscopy. Assignment of the optical emissions was made on the basis of the structural parameters, power-dependent optical studies and depth-resolved CL. Power-dependent studies allowed us to distinguish between quantum confined and buffer emissions. On increasing the power injection conditions, a QD-size-dependent blue shift due to the screening of the internal electric fields was found together with a trend to saturation observed in the high injection limit. The possible evidence of excited states has also been shown by power-dependent photoluminescence and CL. Different blue shifts in specimens with different numbers of stacked layers suggested possible different residual strain values as confirmed by mu-Raman studies. Depth-resolved CL investigations performed at constant power injection per unit volume allowed us to distinguish between QD layers with different nominal GaN coverages and a linear dependence of peak energy versus GaN monolayer number has also been found. Adding 1 ML of GaN resulted in an average shift of about 150 meV. The existence of QDs with different size distributions along the growth axis was also found. The observations were confirmed by NSOM spectroscopy. [References: 18]
机译:自组织的GaN / AlN堆叠量子点(QD)已通过阴极发光(CL),近场扫描光学显微镜(NSOM),光致发光,μ拉曼光谱和透射电子显微镜进行了研究。根据结构参数,与功率有关的光学研究和深度分辨CL进行光发射的分配。依赖功率的研究使我们能够区分量子限制发射和缓冲发射。在增加功率注入条件时,发现由于内部电场的屏蔽而导致的与QD大小有关的蓝移,以及在高注入极限下观察到的饱和趋势。功率相关的光致发光和CL也显示出激发态的可能证据。穆拉曼研究证实,具有不同数量的堆叠层的样品中的不同蓝移表明可能存在不同的残余应变值。在每单位体积恒定功率注入下进行的深度分辨CL研究使我们能够区分具有不同标称GaN覆盖率的QD层,并且还发现了峰值能量与GaN单层数的线性相关性。添加1 ML的GaN导致平均位移约为150 meV。还发现了沿生长轴具有不同尺寸分布的量子点的存在。通过NSOM光谱证实了这些观察结果。 [参考:18]

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