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Growth of ZnSe : N epilayers by pulsed laser ablation deposition

机译:脉冲激光烧蚀沉积生长ZnSe:N外延层

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Epilayers of nitrogen doped ZnSe have been grown on GaAs(100) substrates by pulsed laser ablation deposition assisted by a nitrogen beam produced by a supersonic nozzle beam source. X-ray photoelectron spectroscopy (XPS) shows that the epilayers are composed of 83.8% Zn and Se, 10.4% N and 5.8% O, and other kinds of impurity are rare. XPS spectra of Zn(2p(3/2)) and N(1s) core levels indicate that doped nitrogen with an estimated concentration of over 10(21) cm(-3) exists in the as-grown epilayer. Atomic force microscopy indicates that the surface of an as-grown ZnSe epilayer on GaAs(100) is flat with roughness of about 1.2 nm, which is less than that of some good-quality metalorganic vapour phase epitaxy grown layers. X-ray diffraction results show that these ZnSe epilayers are a characteristic of single crystallinity. [References: 18]
机译:在超音速喷嘴束源产生的氮气束的辅助下,通过脉冲激光烧蚀沉积,在GaAs(100)衬底上生长了氮掺杂ZnSe的外延层。 X射线光电子能谱(XPS)表明,外延层由83.8%的Zn和Se,10.4%的N和5.8%的O组成,其他种类的杂质很少。 Zn(2p(3/2))和N(1s)核心能级的XPS光谱表明,在生长的外延层中存在估计浓度超过10(21)cm(-3)的掺杂氮。原子力显微镜检查表明,GaAs(100)上生长的ZnSe外延层表面平坦,粗糙度约为1.2 nm,小于某些高质量的金属有机气相外延生长层的粗糙度。 X射线衍射结果表明,这些ZnSe外延层是单结晶性的特征。 [参考:18]

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