Photosensitivity Characteristics of UV Curable Organic-Inorganic Hybrids Sensitized with Benzoin Derivatives as Photobase Generators

摘要

Most of the photo crosslinkable materials are based on photoradical polymerization and photocationic polymerization. The technologies are widely used in resists [1], coatings [2], printings [3], adhesions [4] and so on because many photoradical and photoacid generators (PAGs), monomers, and oligomers are commercially available. On the other hand, the reports of photobase generators (PBGs) are rare when compared with PAGs because of their low quantum yields and relatively low basicity of generated bases. Anionic UV curing is an excellent method because it is free from polymerization inhibition by oxygen, termination by water, corrosion of metal substrates, and volume shrinkage. Until now, several researchers have reported PBGs and demonstrated the advantages of PBGs in the field of photolithography [5-11]. The improvement of the quantum yield for photobase generation and of the basicity of photogenerated bases is strongly needed. Recently, we have reported photoreactive carboxylates comprising ketoprofen and superbases as novel PBGs, which undergo photodecarboxylation to generate free superbases with high quantum yields [12]. A novel anionic