首页> 外文期刊>Journal of Nuclear Materials: Materials Aspects of Fission and Fusion >Spectroscopic measurement of biasing effect on sheath electric field distribution in front of a metal plate inserted in a plasma flow
【24h】

Spectroscopic measurement of biasing effect on sheath electric field distribution in front of a metal plate inserted in a plasma flow

机译:用光谱法测量对等离子流中插入的金属板前面的鞘电场分布的偏置作用

获取原文
获取原文并翻译 | 示例
           

摘要

A model type experiment was made to study the biasing effect on localized electric field distribution in front of a negative DC biased metal disk in the He plasma flow from an ECR plasma source using the polarized laser-induced fluorescence (LIF) technique. A nonlinear decrease of the electric field strength was observed in distance from the electrode surface for the biasing voltage from 300 to 650 V. The sheath thickness variation was found to be proportional to the applied bias voltage to the 3/5 power. The experimental results ale explained on the basis of a collisional sheath model. The applicability of this LIF technique to measurement of the electric field distribution in a biased divertor plasma is briefly discussed. (C) 2001 Elsevier Science B.V. All rights reserved. [References: 8]
机译:进行了模型实验,研究了使用偏光激光诱导荧光(LIF)技术对来自ECR等离子体源的He等离子体流中负直流偏置金属盘前面的局部电场分布的偏置效应。对于300至650 V的偏置电压,在距电极表面的距离中观察到电场强度的非线性下降。发现护套厚度变化与施加到3/5功率的偏置电压成比例。实验结果完全基于碰撞护套模型进行了解释。简要讨论了该LIF技术在偏置偏滤器等离子体中测量电场分布的适用性。 (C)2001 Elsevier Science B.V.保留所有权利。 [参考:8]

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号