Relationship between dental implant stability determined by resonance frequency analysis measurements and peri-implant vertical defects: an in vitro study.

摘要

Resonance frequency (RF) analysis is a non-invasive and objective technique developed for implantology, where it measures the stability of the implant in the bone socket. A limited number of studies were performed to compare different stability measurement devices. The aim of the study was to evaluate the association between the implant stability and peri-implant vertical defect by using the new wireless RF analyser. Micro-textured rough-surfaced implants with diameters of 3.7 and 4.8 mm and with a length of 12 mm were used. The peak insertion torque was recorded with the help of the torque control system only during the implant placement. The peri-implant defects were created in millimetre increments ranging between 0 and 5 mm to the same extent on all implants. The RF analysis values were measured by using the RF analyser. Significant correlation was found between insertion torque (44.3 +/- 3 N cm) and implant stability quotient (ISQ) (all implants: r = 0.76, 3.7 mm diameter: r = 0.65, 4.8 mm diameter: r = 0.80). For 3.7 x 12-mm(2) implants, the mean ISQ values were 72.6 +/- 2.4, 69.8 +/- 2, 67.2 +/- 1.8, 64.3 +/- 1.9, 61.2 +/- 2 and 57.2 +/- 2.5 when peri-implant vertical defects were 0, 1, 2, 3, 4 and 5 mm; and the corresponding values were 76.5 +/- 2.2, 74.5 +/- 2.2, 72.3 +/- 2, 70 +/- 1.9, 67 +/- 1.9 and 63.4 +/- 2.3, respectively, for 4.8 x 12-mm(2) implants. All values were significantly different when compared with each other. The wireless RF analyser seems to be a suitable and reliable device to determine the implant stability. Peri-implant bone loss simulated by using acrylic models may result with a decrease in ISQ values for osseo-integrated implants measured by the RF analyser.