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首页> 外文期刊>Journal of optoelectronics and advanced materials >Simulation and analysis on the property of aluminum back-surface-field of monocrystalline silicon solar cells
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Simulation and analysis on the property of aluminum back-surface-field of monocrystalline silicon solar cells

机译:单晶硅太阳能电池铝背面场特性的仿真分析

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The effects of thickness and doping profile of heavily-doped Aluminum Back-Surface-Field(AI-BSF), as well as the trap levels of impurities in AI-BSF, on electronic properties of n~+pp~+ monocrystalline solar cells, were investigated by PC1D The results show the electronic properties of the solar cells are hardly affected by the gradient of the doping profile of AI-BSF, but mainly depend on the Al/B atomic amount in AI-BSF. The optimum thickness of AI/B-BSF is about 10μm with the average Al/B atomic concentration of AI-BSF less than -6.56x10~(18)cm~(-3). The effect of the oxygen trap level on the electronic properties relates to the back surface recombination velocity (BSRV) and the average Al/B atomic concentration.
机译:重掺杂铝背表面场(AI-BSF)的厚度和掺杂分布以及AI-BSF中杂质的陷阱能级对n〜+ pp〜+单晶太阳能电池电子性能的影响,用PC1D进行了研究。结果表明,太阳能电池的电子性能几乎不受AI-BSF掺杂曲线梯度的影响,但主要取决于AI-BSF中的Al / B原子量。 AI / B-BSF的最佳厚度约为10μm,AI-BSF的平均Al / B原子浓度小于-6.56×10〜(18)cm〜(-3)。氧陷阱能级对电子性能的影响与背面复合速度(BSRV)和平均Al / B原子浓度有关。

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