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Morphology and optical properties of Mg doped GaN nanowires in dependence of growth temperature

机译:镁掺杂GaN纳米线的形貌和光学性质与生长温度的关系

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The influence of the substrate temperature and Mg doping on the morphological and optical properties of catalyst-free GaN nanowires grown by plasma-assisted molecular beam epitaxy on Si(111) has been investigated in a large temperature range between 665°C and 785°C. The density and wire sizes in Mg-doped nanowires are found to change with substrate temperature in a similar way as undoped nanowires. Between 725 °C and 785 °C a trimodal size distribution and an increase of the wire density from 5.0×10 ~9 cm~(-2) to 9.5×10~9 cm~(-2) were observed. Transmission electron microscopy indicates that the upper parts of the nanowires are free of structural defects. Raman spectroscopy measurements confirm a high crystalline quality of doped wires, with a line width of the E_2~H of 3.3 cm~(-1) for samples grown at T _s=785 °C. Photoluminescence measurements show a strong influence of Mg on the emission properties, namely the increase of the donor-acceptor pair emission and its phonon replicas.
机译:研究了衬底温度和Mg掺杂对在665°C至785°C的较大温度范围内通过等离子辅助分子束外延在Si(111)上生长的无催化剂GaN纳米线的形态和光学性能的影响。 。发现掺杂镁的纳米线的密度和线径以与未掺杂的纳米线相似的方式随衬底温度而变化。在725°C和785°C之间,观察到三峰尺寸分布,线密度从5.0×10〜9 cm〜(-2)增加到9.5×10〜9 cm〜(-2)。透射电子显微镜表明,纳米线的上部没有结构缺陷。拉曼光谱测量证实了掺杂导线的高结晶质量,对于在T_s = 785°C下生长的样品,E_2〜H的线宽为3.3 cm〜(-1)。光致发光测量结果显示,Mg对发射特性有很强的影响,即供体-受体对发射及其声子副本的增加。

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