Surface topography and optical properties of nitrogen doped ZnO thin films formed by radio frequency magnetron sputtering on fused silica substrates

摘要

We report here on the nitrogen doped ZnO (ZnO:N) thin films deposited by radio frequency (rf) magnetron sputtering using ZnN target (99.9% purity) on, unintentionally heated, fused silica substrates. After deposition Rapid Thermal Annealing (RTA) at 400 and 550°C for 1min in N_2 ambient have been performed on the ZnO:N thin films. The RTA impact on the optical and microstructural properties of ZnO:N thin films have been investigated by X-ray diffraction, Atomic Force Microscopy, Scanning and Transmission Electron Microscopy coupled with Energy Dispersive X-ray analysis, UV-VIS-NIR spectrophotometry and UV-VIS-NIR-Far IR Spectroscopic Ellipsometry. XRD and AFM results revealed an improvement in the crystalline state of ZnO:N and a reduction in the films surface roughness following RTA. The EDX spectrum showed the presence of the nitrogen in small quantities in the ZnO structure (nitrogen/oxygen=1/8). The optical constants of ZnO:N from UV down to Far IR spectral range together with the infrared active modes for ZnO:N are also reported.