Kinetics of O and H atoms in pulsed O-2/HMDSO low pressure PECVD plasmas

摘要

The 0 and H atom kinetics in a low pressure inductively coupled radiofrequency O-2/Hexamethyldisiloxane and water vapour pulsed plasma is investigated by Time-Resolved Optical Emission Spectroscopy. The O and H-atom loss coefficients in the post-discharge of O-2/HMDSO pulsed plasmas were measured to be 210(-3) and 3.10(-4) respectively. Such low recombination coefficients, as compared to the ones measured in oxygen plasmas (approximate to 10(-2)), are attributed to the adsorption of OH and H2O at the reactor walls which limits the O and H atom recombination. O and H atoms are likely to be responsible for HMDSO dissociation and subsequent film deposition during the post-discharge.