Electron cyclotron resonance assisted deposition of protective SiO2 films

摘要

Electron cyclotron resonance (ECR) assisted e-gun deposition of SiO2 films under conditions of oil-free vacuum has been studied. The SiO2 films were deposited under different Ar+-assisted conditions on the substrates of glass, Al and polycarbonate (PC). The optical characteristics of the layers were investigated in the VIS and IR ranges, together with their environmental stability and adhesion to substrates. The results obtained show that the films were transparent and defect-free. It was found that increases in the ion to atom ratio Got, and Ar ion energy (up to 450 eV) led to film densification and, for films deposited at high deposition rate R, to the improvement of their environmental stability and adhesion to substrates.