How the angular position of a photomask affects the angular errors of circular optical scales when they are being produced

摘要

This paper discusses how the angular disposition of a photomask during the production of circular optical scales fabricated by lift-off photolithography using this photomask affects their accumulated angular error. The angular errors of the circular optical scales are investigated by using a phase-statistical method, and the errors are determined that are introduced into the angular errors of the scale in conjunction with the image generator and the exposure operation. (C) 2015 Optical Society of America.