...
首页> 外文期刊>Journal of neurosurgery. >Dual-floor burr hole adjusted to burr-hole ring and cap for implantation of stimulation electrodes. Technical note.
【24h】

Dual-floor burr hole adjusted to burr-hole ring and cap for implantation of stimulation electrodes. Technical note.

机译:双层毛刺孔调整为毛刺孔环和帽盖,用于植入刺激电极。技术说明。

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

Using a new perforator, the authors have developed a new dual-floor burr-hole method for use in deep brain stimulation therapy. The modification is called "dual-floor" because the usual 15-mm-diameter burr hole, which is located centrally and reaches the dura mater, is surrounded by a 4-mm-wide rim that is also planed downward by the new perforator to a depth of 4 mm. This dual-floor burr hole is adjusted to fit the burr-hole ring and cap that are are supplied by the electrode manufacturer. Such a method eliminates bulging of the scalp just over the burr-hole ring and cap. In addition, it is helpful for securing a tight fixation between the burr-hole ring and the skull.
机译:使用新的射孔器,作者开发了一种新的双层毛刺孔方法,用于深部脑刺激治疗。这种修改称为“双底”,因为通常位于中心并到达硬脑膜的直径为15毫米的毛刺孔被一个4毫米宽的轮辋包围,该轮辋也由新的射孔器向下规划以深度为4毫米。调整该双层毛刺孔以适合电极制造商提供的毛刺孔环和盖。这种方法消除了刚好在毛刺孔环和帽上方的头皮凸起。此外,它有助于确保毛刺孔环和颅骨之间的牢固固定。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号