Fabricating high-resolution offset color-filter black matrix by integrating heterostructured substrate with inkjet printing

摘要

This paper presents a self-aligning ink by integrating an inkjet printing technique and heterostructures to fabricate a black matrix with a micrometer-scale tunable thickness. The black matrix is a grid-like structure used in color filters. Traditionally, a black matrix has been fabricated using photolithography techniques, the disadvantages of which are high material consumption, less fabrication flexibility, complex processing procedures, and high chemical pollution. Inkjet printing technology has garnered attention because of its low material costs, high fabrication flexibility, and reduced processing procedures and pollution. In this study, a fabricating process combining an inkjet printing technique with heterostructures to form stripe-arranged and delta-arranged thickness-tunable black matrices has been demonstrated. The deformation and self-aligning process of ink droplet impingement onto gutters are driven by designed heterogeneous surface properties. The minimum track width attained is 10 μm, which is competitive for color filter resolutions for thin-film transistor liquid crystal displays. The developed technology surmounts the bottlenecks of inkjet printing resolution, and saves more than 75% black material than modern photolithography.