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Theoretical analysis of the effect of static charges in silicon-based dielectric thin films on micro-to nanoscale electrostatic actuation

机译:硅基介电薄膜中的静电荷对微纳米静电致动影响的理论分析

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摘要

Silicon-based dielectric thin films such as SiO2 and Si3N4 are commonly used as insulation layers in electrostatic microactuators to protect the device from short circuiting if the electrodes are in contact. However, dielectric films can store bulk and/or surface static charges. In this paper, the effect that these static charges have on the force applied by an electrostatic actuator is analyzed. Based on a one-dimensional model, the electric field within the gap of an electrostatic actuator for a metal/gap/dielectric/doped silicon-layered configuration is calculated for three assumed charge distributions in the dielectric layer. A characteristic voltage is defined for the metal/gap/dielectric/doped silicon system with static charges, which is found to govern the interaction. It is found that when the applied voltage to the actuator is within one order of magnitude of the characteristic voltage, the real electric field within the gap can differ by many orders of magnitude from the electric field that is predicted without considering the static charges.
机译:硅基介电薄膜(例如SiO2和Si3N4)通常用作静电微致动器中的绝缘层,以保护器件在电极接触时不会发生短路。但是,介电膜可以存储大量和/或表面静电荷。在本文中,分析了这些静电荷对静电执行器施加的力的影响。基于一维模型,针对介电层中的三个假定电荷分布,计算出用于金属/间隙/电介质/掺杂硅层结构的静电致动器间隙内的电场。为具有静电荷的金属/间隙/电介质/掺杂硅系统定义了特征电压,发现该特征电压决定了相互作用。发现当施加到致动器的电压在特征电压的一个数量级之内时,间隙内的实际电场可能与不考虑静电荷而预测的电场相差很多数量级。

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