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Field emission studies of diamond-like films grown by RFCVD

机译:RFCVD生长的类金刚石薄膜的场发射研究

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摘要

Hydrogenated amorphous carbon films (a-C:H) prepared by radio-frequency plasma-enhanced chemical vapor deposition are expected to have practical uses in electro-optics devices. The exceptionally low electron work function makes it a promising material for uses in field emission devices. This work demonstrated that hydrogen gas annealed and boron-doped diamond-like films deposited on gold silicide surfaces increase the field emission efficiency greatly. (C) 2000 Published by Elsevier Science B.V. All rights reserved. [References: 21]
机译:通过射频等离子体增强化学气相沉积制备的氢化非晶碳膜(a-C:H)有望在电光器件中得到实际应用。低电子功函使其成为用于场发射器件的有前途的材料。这项工作表明,在硅化金表面沉积氢气退火和掺硼的类金刚石薄膜大大提高了场发射效率。 (C)2000,Elsevier Science B.V.保留所有权利。 [参考:21]

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