We investigated the aluminum-induced crystallization of amorphous silicon (a-Si) during the aluminum-induced layer exchange (ALILE) process, in which a stack of glass/Al/a-Si is transformed into a glass/polycrystalline silicon (poly-Si)/Al(Si) structure by an annealing step well below the eutectic temperature of the Al/Si system. Our experiments resulted in continuous large-grained poly-Si films on glass substrates. The nucleation and the growth of the crystalline phase during the ALILE process was observed using an optical microscope. We found an activation energy of 1.8 eV for the nucleation process and we related this energy to a large barrier at the a-Si/Al interface. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 10]
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