Advances in hot wire chemical vapor deposition technology for the synthesis of novel silicon thin films materials

摘要

We report in this paper on fabrication of an advanced hot wire chemical vapor deposition technique. We introduced for the first time 'box-type' ceramics filament holder in hot-wire CVD technology. The surface topography and atomic-scale structure of the films synthesized by the new ceramics hot-wire CVD technique have been compared with that of films prepared with that of standard hot-wire CVD. (c) 2006 Elsevier B.V. All rights reserved.