Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers for sub-50 nm EUV lithography

摘要

A new series of anionic photoacid generators (PAGs) and corresponding polymers were prepared. The thermostability of PAG bound polymers was superior to that of PAG blend polymers. PAG incorporated into the polymer main chain showed improved resolution when compared with the PAG blend polymers. This was demonstrated by extreme ultraviolet lithography (EUVL) results: the fluorine PAG bound polymer resist gave 45 nm ( 1 : 1), 35 nm ( 1 : 2), 30 nm ( 1 : 3) and 20 nm ( 1 : 4) Line/Space as well as the 50 nm ( 1 : 1) elbow pattern.