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Carrier dilution in TiSe2 based intergrowth compounds for enhanced thermoelectric performance

机译:在基于TiSe2的共生化合物中稀释载体以增强热电性能

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Synthesis and electrical properties of kinetically stabilized (PbSe)(1+delta)(TiSe2) n thin-film intergrowths are reported for 1 <= n <= 18. A linear increase in the c-lattice parameter of the intergrowth is observed as n is increased and the slope is consistent with the inclusion of an additional TiSe2 structural unit as n is incremented by 1 and the observed intercept is consistent with the expected thickness of a PbSe bilayer. The charge donated to the TiSe2 constituent from the PbSe is diluted across more layers as n is increased, leading to a systematic increase in the Seebeck coefficient. The room temperature resistivity values of the reported compounds are all on the order of 10(-5) Omega m and depend on defect densities that affect the mobility, making the magnitude of the resistivity less sensitive to n. The temperature dependence is metallic for large n, with a slight upturn at low temperatures due to localization of carriers for small n values. The power factor increases with n, including the highest reported for chalcogenide misfit layered and related compounds, showing that nanostructuring and modulation doping are an effective means of tuning the power factor of thermoelectric intergrowth materials. Since these compounds have very low thermal conductivity due to structural anisotropy and misregistration between intergrowth constituents, this suggests that varying their nanoarchitecture is a promising approach to obtain high values of zT.
机译:动态稳定的(PbSe)(1 + delta)(TiSe2)n薄膜共生体的合成和电性能报告为1 <= n <=18。该共生体的c晶格参数线性增加为n当n增加1时,斜率与增加的TiSe2结构单元一致,并且观察到的截距与PbSe双层的预期厚度一致。随着n的增加,从PbSe捐赠给TiSe2成分的电荷会在更多的层上稀释,从而导致塞贝克系数的系统性增加。报告的化合物的室温电阻率值都在10(-5)Ω量级,并且取决于影响迁移率的缺陷密度,从而使电阻率的大小对n的敏感性降低。对于大的n,温度依赖性是金属性的,在低温下由于载流子的位置对于小n值而略有上升。功率因数随n的增加而增加,其中包括硫族化物错配层状化合物和相关化合物的最高报道,表明纳米结构和调制掺杂是调节热电共生材料的功率因数的有效手段。由于这些化合物由于结构各向异性和共生成分之间的配准失调而具有非常低的热导率,因此这表明改变其纳米结构是获得高zT值的有前途的方法。

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