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首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >Asymmetric fused thiophenes for field-effect transistors: crystal structure-film microstructure-transistor performance correlations
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Asymmetric fused thiophenes for field-effect transistors: crystal structure-film microstructure-transistor performance correlations

机译:场效应晶体管的不对称稠合噻吩:晶体结构-膜微结构-晶体管性能的相关性

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New asymmetric phenyl and perfluorophenyl end-functionalized dithienothiophene (DTD- and bisdithienothiophene (BDTD-based fused-thiophene derivatives (FPP-DTT; 1 and FPP-BDTT; 3} were synthesized and characterized for organic thin-film transistor (OTFT) applications. For comparison, symmetric phenyl end-capped dithienothiophene and bisdithienothiophene derivatives DP-DTT (2) and DP-BDTT (4) were also explored in parallel. The crystal structures of all four molecules were determined via single-crystal X-ray diffraction. Asymmetric compounds 1 and 3 exhibit face-to-face π-π stacking, while symmetric 2 and 4 show herringbone stacking. Single-crystal and thin-film transistors based on these four materials were fabricated. For single-crystal transistors, asymmetric FPP-DTT and FPP-BDTT gave high p-channel mobilities of 0.74 and 0.73 cm~2 V~(-1) s~(-1), respectively, as well as current on/off ratios of ~10~5. Symmetric DP-DTT and DP-BDTT gave relatively lower p-channel mobilities of 0.36 and 0.41 cm~2 V~(-1) s~(-1), respectively. For thin-film transistors, FPP-DTT and DP-DTT films deposited at 25 °C exhibited decent p-channel characteristics with a carrier mobility as high as 0.15 and 0.20 cm~2 V~(-1) s~(-1), respectively for top-contact/bottom-gate OTFT devices. The device characteristics on various gate dielectrics have been correlated with the film morphologies and microstructures of the corresponding compounds.
机译:合成了新的不对称苯基和全氟苯基末端官能化的二噻吩并噻吩(DTD和双二噻吩并噻吩(基于BDTD的稠合噻吩衍生物(FPP-DTT; 1和FPP-BDTT; 3}),并对其进行了表征,以用于有机薄膜晶体管(OTFT)应用。为了进行比较,还平行研究了对称的苯基封端的二硫代噻吩和双二硫代噻吩衍生物DP-DTT(2)和DP-BDTT(4),并通过单晶X射线衍射确定了所有四个分子的晶体结构。化合物1和3具有面对面的π-π堆叠,而对称2和4具有人字形的堆叠,则基于这四种材料制造了单晶和薄膜晶体管。对于单晶晶体管,非对称FPP-DTT FPP-BDTT和FPP-BDTT的p通道迁移率分别为0.74和0.73 cm〜2 V〜(-1)s〜(-1),电流开/关比约为10〜5。而DP-BDTT的p通道迁移率相对较低,为0.36和分别为0.41 cm〜2 V〜(-1)s〜(-1)。对于薄膜晶体管,在25°C时沉积的FPP-DTT和DP-DTT膜具有良好的p沟道特性,载流子迁移率高达0.15和0.20 cm〜2 V〜(-1)s〜(-1) ,分别用于顶部接触/底部栅极OTFT器件。各种栅极电介质上的器件特性已与相应化合物的薄膜形态和微观结构相关联。

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