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Optical features of noble-metal-oxide thin films under irradiation of blue laser

机译:蓝光照射下贵金属氧化物薄膜的光学特性

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摘要

The optical reflectance and transmittance of Platinum oxide (PtOx) and palladium oxide (PdOx) thin films for ultrahigh-density optical storage are investigated using Z-scan technique under irradiation of blue laser (442 nm). The power thresholds of the PtOx and PdOx decomposition, 3.1 mW and 2.6 mW, are obtained respectively; the PtOx (PdOx) thin film is reversible and irreversible when input power is less than and more than 3.1 mW (2.6 mW). Deformation analyses by using an atom force microscope (AFM), which is formed in the micro irradiation region of surface on the thin film samples due to decomposition of the PtOx or PdOx driving the Z-scan, agree well with the Z-scan results. The optical features obtained at 442-nm wavelength are compared with those at 532-nm wavelength, and the threshold difference between the two wavelengths is also analysed in detail based on wavelength-dependent average power density and wavelength-selected absorption of the thin films.
机译:在蓝色激光(442 nm)照射下,采用Z扫描技术研究了用于超高密度光存储的氧化铂(PtOx)和氧化钯(PdOx)薄膜的光反射率和透射率。 PtOx和PdOx分解的功率阈值分别为3.1 mW和2.6 mW。当输入功率小于或等于3.1 mW(2.6 mW)时,PtOx(PdOx)薄膜是可逆的和不可逆的。通过使用原子力显微镜(AFM)进行的变形分析与Z扫描结果非常吻合,该原子力显微镜是由于PtOx或PdOx分解而在薄膜样品表面的微辐照区域形成的。将在442 nm波长处获得的光学特征与在532 nm波长处获得的光学特征进行比较,并且还根据与波长相关的平均功率密度和薄膜的波长选择吸收率,对两个波长之间的阈值差异进行了详细分析。

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