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Pressure-induced structural phase transformations in silicon nanowires

机译:硅纳米线中压力诱导的结构相变

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High-pressure structural behavior of silicon nanowires is investigated up to ∼ 22 GPa using angle dispersive X-ray diffraction measurements. Silicon nanowires transform from the cubic to the P-tin phase at 7.5-10.5 GPa, to the lmma phase at ∼ 14 GPa, and to the primitive hexagonal structure at ∼ 16.2 GPa. On complete release of pressure, it transforms to the metastable R8 phase. The observed sequence of phase transitions is the same as that of bulk silicon. Though the X-ray diffraction experiments do not reveal any size effect, the pressure dependence of Raman modes shows that the behavior of nanowires is in between that of the bulk crystal and porous Si.
机译:对硅纳米线的高压结构行为进行了研究,直至∼使用角色散X射线衍射测量结果为22 GPa。硅纳米线在7.5-10.5 GPa时从立方相转变为P-锡相,在∼处转变为lmma相。 14 GPa,并在∼处变为原始六边形结构; 16.2 GPa。完全释放压力后,它将转变为亚稳R8相。观察到的相变顺序与体硅相同。尽管X射线衍射实验没有发现任何尺寸效应,但拉曼模式的压力依赖性表明纳米线的行为介于大晶体和多孔硅之间。

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