首页> 外文期刊>Journal of Modern Optics >Optical topometry of surfaces with locally changing materials, layers and contaminations Part 2: Fringe projection topometry
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Optical topometry of surfaces with locally changing materials, layers and contaminations Part 2: Fringe projection topometry

机译:具有局部变化的材料,层和污染物的表面的光学形貌第2部分:条纹投影形貌

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摘要

Conventional topometry evaluation procedures applied to surfaces with locally changing materials or layer structures can result in significant errors in the topometric heights. A new theoretical approach, developed for two-beam interferometry in part 1, is now applied to fringe projection topometry, where the oblique incidence of two or three partial plane-wave components has to be considered. Important effects of contrast and phase are presented and applied to some surface structures, and errors in the measured surface height are calculated.
机译:应用于具有局部变化的材料或层结构的表面的常规形貌评估程序可能会导致形貌高度的重大误差。针对第1部分中的两束干涉测量开发的一种新的理论方法现已应用于条纹投影形貌测量,其中必须考虑两个或三个部分平面波分量的倾斜入射。呈现了对比度和相位的重要影响,并将其应用于某些表面结构,并计算出所测量表面高度的误差。

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