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Two-photon interferometry for high-resolution imaging

机译:双光子干涉仪用于高分辨率成像

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This paper discusses the advantages of using non-classical states of light for two aspects of optical imaging: the creation of microscopic images on photosensitive substrates, which constitutes the foundation for optical lithography, and the imaging of microscopic objects. In both cases, the classical resolution limit given by the Rayleigh criterion is approximately half of the optical wavelength. It has been shown, however, that by using multi-photon quantum states of the light field, and a multi-photon sensitive material or detector, this limit can be surpassed. A rigorous quantum mechanical treatment of this problem is given, some particularly widespread misconceptions are addressed, and turning quantum imaging into a practical technology is discussed.
机译:本文讨论了在光学成像的两个方面使用非经典状态的光的优点:在感光基板上创建显微图像(构成光学光刻的基础)和显微对象的成像。在这两种情况下,瑞利标准给出的经典分辨率极限约为光波长的一半。然而,已经表明,通过使用光场的多光子量子态以及多光子敏感材料或检测器,可以超过该限制。对此问题进行了严格的量子力学处理,解决了一些特别普遍的误解,并讨论了将量子成像变成一种实用技术。

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