Microstructure fabrication is not only of immense importance for microelectronics technology but also plays a vital role as a potent tool for carrying out investigations relating to behavior of materials at sub micron scales. In the recent years, it has broadened to encompass more and more areas of multidiscipline. A variety of possible applications include high power microwave generation, ultra fast computer and tetra hertz amplifier devices fabrication, radiation and temperature insensitive electronics. Fields where well-established applications already exist include field emitters; electrochemistry; conductive polymer nanofibers fabrication; transparent metal structures and macroscopic quantum tunneling phenomena. Of the many possible geometrical shapes and growth patterns, the simplest structure is probably an ensemble of wires. A variety of techniques like optical, X-rays, electron and ion beam lithography have been used for fabrication of such ensembles. However, electrochemical methods involving electrodeposition of metals into the etched pores of nuclear track filters (NTFs) of mica and polymers, are a convenient and simple technique [1-6].
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