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Influence of growth parameters on the structure of YBCO thin films prepared by sequential deposition and annealing

机译:生长参数对依次沉积和退火制备的YBCO薄膜结构的影响

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摘要

The microwave application of superconductors generally requires large area double-sided Y_1Ba_2Cu_3O_(7-x) (YBCO) thin films. Epitaxial YBCO thin films have been successfully prepared by in situ and ex situ procedures [1]. The crystalline qualities of in situ grown YBCO thin films are usually good. But it is difficult to prepare large size double'sided YBCO thin films by in situ growth procedure because of complication of the apparatus [2, 3]. Although the crystalline qualities of ex situ grown YBCO thin films are not as good as that of the in situ grown ones. It is convenient to prepare large area double-sided YBCO thin films by ex situ procedure [4, 5]. A new growth procedure, sequential deposition and annealing (SDA), which is suitable for fabrication of large size epitaxy thin films, was proposed [6]. Purely c-axis oriented YBCO thin films were prepared by SDA. Influence of growth parameters on the structure and superconducting transition properties of SDA grown YBCO thin films is reported in this letter.
机译:超导体的微波应用通常需要大面积的双面Y_1Ba_2Cu_3O_(7-x)(YBCO)薄膜。外延YBCO薄膜已通过原位和异位方法成功制备[1]。原位生长的YBCO薄膜的晶体质量通常很好。但是由于设备的复杂性,很难通过原位生长工艺制备大尺寸的双面YBCO薄膜[2,3]。尽管异位生长的YBCO薄膜的晶体质量不如原位生长的晶体。通过异位法制备大面积双面YBCO薄膜很方便[4,5]。提出了一种适用于大尺寸外延薄膜制造的新生长工艺,顺序沉积和退火(SDA)[6]。通过SDA制备纯c轴取向的YBCO薄膜。这封信报道了生长参数对SDA生长的YBCO薄膜的结构和超导过渡性能的影响。

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