Electrical properties of TiNx films on p-silicon substrates obtained by reactive ion beam assisted deposition technique

Narsale AM.; Kothari DC.; Guzman L.; Miotello A.; Ali YP.

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Electrical properties of TiNx films on p-silicon substrates obtained by reactive ion beam assisted deposition technique

机译：反应离子束辅助沉积技术获得的p-Si衬底上TiNx膜的电性能

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来源
《Journal of Materials Science Letters 》 |1998年第8期| 共3页
作者
Narsale AM.; Kothari DC.; Guzman L.; Miotello A.; Ali YP.;
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正文语种 eng
中图分类工程材料学 ;
关键词
N-type silicon; Thin-films; Titanium nitride; Device technology; Barrier height; Implantation; Metal;

机译：N型硅薄膜氮化钛器件技术势垒高度注入金属;

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专利

1. Electrical properties of TiNx films on p-silicon substrates obtained by reactive ion beam assisted deposition technique [J] . Narsale AM., Kothari DC., Guzman L., Journal of Materials Science Letters . 1998 ,第8期

机译：反应离子束辅助沉积技术获得的p-Si衬底上TiNx膜的电性能
2. Temperature dependence of InN film deposition by an RF plasma-assisted reactive ion beam sputtering deposition technique [J] . Shinoda H, Matsukura N Thin Solid Films . 2005 ,第2期

机译：射频等离子体辅助反应离子束溅射沉积技术沉积InN膜的温度依赖性
3. Deposition of an InN thin film by a r.f. plasma-assisted reactive ion-beam sputtering deposition (R-IBD) technique [J] . Hiroyuki Shinoda, Nobuki Mutsukura Diamond and Related Materials . 2002 ,第3a6期

机译：通过射频沉积InN薄膜等离子体辅助反应离子束溅射沉积（R-IBD）技术
4. Structural, morphological, electrical and luminous properties of undoped microanocrystalline silicon films deposited by ion-assisted beam deposition techniques [C] . H.R.Khan, H.Frey, F.Banhart Symposium J on Correlated Effects in Atomic and Cluster Ion Bombardment and Implantation, Symposium C on Pushing the Limits of Ion Beam Processing-From Engineering to Atomic Scale Issues, And Symposium H on Advanced Deposition Processes and Character . 1995

机译：通过离子辅助束沉积技术沉积的未掺杂微/纳米晶体硅膜的结构，形态，电学和发光性质
5. Process-structure-property relationships of micron thick gadolinium oxide films deposited by reactive electron beam-physical vapor deposition (EB-PVD) [D] . Grave, Daniel A. 2014

机译：通过反应电子束物理气相沉积（EB-PVD）沉积的微米厚氧化ado膜的工艺-结构-性能关系
6. Enhancement of the Adhesive Strength between Ag Films and Mo Substrate by Ag Implanted via Ion Beam-Assisted Deposition [O] . Jiajun Zhu, Yuhao Hu, Meng Xu, 2018

机译：通过离子束辅助沉积注入Ag增强Ag膜与Mo基底之间的粘合强度
7. Effect of Substrate Materials on Tribological Properties of C-N Thin Films Synthesized by Ion-beam-assisted Deposition Technique. [O] . Hidenobu OHTA, Akihito MATSUMURO 2002

机译：基材材料对离子梁辅助沉积技术合成的C-N薄膜的摩擦学性能。

Electrical properties of TiNx films on p-silicon substrates obtained by reactive ion beam assisted deposition technique

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