Titanium dioxide film obtained using the MOCVD method on 316L steel

摘要

Chemical vapour deposition (CVD) methods, parti-cularly their variations using glow discharge (e.g. plasma assisted CVD; PACVD) enable us to produce different films based on titanium, such as TiN, TiC and TiCN [1-5]. PACVD enables the production of films on a steel substrate with good mechanical and corrosion resistant properties. In the case of each of the above coatings, the main reaction gas is TiCU. When TiCl4 is used some chlorine remains in the coating. Parameters of deposition, such as the temperature, the flow of TiCl4 and the glow discharge power, have an influence on the amount of chlorine in the films. Chlorine contained in the films is detrimental to their mechanical properties; the microhardness and adhesion strength decrease with chlorine content [5].