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首页> 外文期刊>Journal of Low Temperature Physics >Negative Magneto- and Electroresistance of Silicon Films with Superconducting Nanoprecipitates: The Role of Inelastic Cotunneling
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Negative Magneto- and Electroresistance of Silicon Films with Superconducting Nanoprecipitates: The Role of Inelastic Cotunneling

机译:具有超导纳米沉淀的硅膜的负磁阻和电阻:非弹性共隧穿的作用

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摘要

The electronic transport properties of insulating Si:Ga films with superconducting, Ga-rich nanoprecipitates are investigated in dependence on temperature, current, and magnetic field. The large negative magnetoresistance, observed below the critical temperature can be explained by Cooper pair breaking and subsequent tunneling of the fermionic quasiparticles. Localization due to quantum interferences of bosons or fermions, as recently discussed, seems not to be the reason for the insulating state and the large magnetoresistance. Cooper pair tunneling is blocked by the high Coulomb barrier. The quasiparticles can overcome the barrier by inelastic cotunneling that results in nonlinear current-voltage characteristics and negative electroresistance. Since the experimental results obtained for the Si:Ga film resemble that of many other films with superconducting nanoprecipitates the conclusions drawn here could be quite general.
机译:根据温度,电流和磁场,研究了具有超导电,富Ga纳米沉淀的绝缘Si:Ga薄膜的电子输运特性。在临界温度以下观察到的大的负磁阻可以通过库珀对断裂和随后的铁离子准粒子的隧穿来解释。如最近所讨论的,由于玻色子或费米子的量子干涉而引起的局部化似乎不是绝缘态和大磁阻的原因。高库仑势垒阻止了库珀对隧穿。准粒子可以通过无弹性的隧道效应克服障碍,从而产生非线性的电流-电压特性和负电阻。由于Si:Ga膜获得的实验结果与其他许多具有超导纳米沉淀的膜的实验结果相似,因此这里得出的结论可能是相当笼统的。

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