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首页> 外文期刊>Journal of Materials Science >High-temperature creep response of a commercial grade siliconized silicon carbide
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High-temperature creep response of a commercial grade siliconized silicon carbide

机译:商业级碳化硅碳化硅的高温蠕变响应

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Creep studies conducted in four-point flexure of acommercial siliconized silicon carbide (Si-SiC, designated asNorth NT230) have been carried out at temperatures of 1300,1370, and 1410℃ in air under selected stress levels. The Si-SiCmaterial investigated contrained ~90%α-SiC , 8% discontinuousfree Si, and 2% porosity. In general, the Si-SiC material exhibitedvery low creep rates (2 to 10×10-10s-1 ) at temperatures ≤1370℃ under applied stress levels of up to 300 Mpa. At 1410℃, themelting poit of Si, the Si-SiC material still showed relative lowcreep rates (~0.8 to 3×10-9s-1 ) at stresses below a threshold valueof ~190Mpa. At stresses >190Mpa the Si-SiC material exhibitedhigh creep rates plus a high stress exponent (n=17) as a result ofslow crack growth assisted process that initiated within Si-richregions. The Si-SiC material, tested at temperature≤1370℃ andbelow the threshold of 190Mpa at 1410℃, exhibited a stressexponent of one, suggestive of diffusional creep processes.
机译:在选定的应力水平下,在空气中的温度1300,1370和1410℃下,对四点弯曲的商业化碳化硅(Si-SiC,指定为North NT230)进行了蠕变研究。所研究的Si-SiC材料含有约90%的α-SiC,8%的不连续游离Si和2%的孔隙率。通常,Si-SiC材料在≤1370℃的温度和最高300 Mpa的应力水平下表现出非常低的蠕变速率(2至10×10-10s-1)。在1410℃(Si的熔化点)下,Si-SiC材料在低于190Mpa阈值的应力下仍显示出相对较低的蠕变率(〜0.8至3×10-9s-1)。在应力大于190Mpa的条件下,Si-SiC材料表现出高蠕变速率和高应力指数(n = 17),这是由于在富硅区域内开始的缓慢的裂纹扩展辅助过程所致。 Si-SiC材料在≤1370℃的温度下进行测试,在1410℃时的阈值低于190Mpa,其应力指数为1,表明存在扩散蠕变过程。

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