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首页> 外文期刊>Journal of Materials Science >Modification of radiation hardness of silicon p-n junction photodiodes by hydrogen plasma treatment
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Modification of radiation hardness of silicon p-n junction photodiodes by hydrogen plasma treatment

机译:氢等离子体处理对硅p-n结光电二极管辐射硬度的改变

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The influence of treatment by a low energy hydrogen ions on degradation of the spectral response, diffusion length of minority carriers (L-D) and efficiency (eta) of silicon p-n junction photodiodes ( solar cells without antireflective coatings) under the effect of electron irradiation has been investigated. Evaluation of the radiation hardness was made by subjecting the unhydrogenated and hydrogenated photodiodes to 1 MeV electron irradiation with doses of (0.1 divided by 3) x 10(15) cm(-2). The measurements have shown that pre-hydrogenation of the silicon p-n junction devices significantly decreases the degradation rate of LD and. thereby improving their radiation hardness. (C) 2005 Springer Science + Business Media, Inc.
机译:在电子辐照作用下,低能氢离子处理对硅pn结光电二极管(不带抗反射涂层的太阳能电池)的光谱响应,少数载流子的扩散长度(LD)的扩散长度和效率(η)的影响已经受到影响。调查。通过用(0.1除以3)×10(15)cm(-2)的剂量对未氢化和氢化的光电二极管进行1 MeV电子辐照来进行辐射硬度的评估。测量结果表明,硅p-n结器件的预氢化显着降低了LD的降解速率。从而提高其辐射硬度。 (C)2005年Springer Science + Business Media,Inc.

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