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Oxidation behavior of silicon nitride sintered with Lu2O3 additive

机译:Lu2O3添加剂烧结的氮化硅的氧化行为。

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摘要

Kyocera SN282 silicon nitride ceramics sintered with 5.35 wt% Lu2O3 were oxidized in dry oxygen at 930-1,200 degrees C. Oxidation of SN282 follows a parabolic rate law. SN282 exhibits significantly lower parabolic rate constants and better oxide morphological stability than silicon nitride containing other sintering additives under similar conditions. The activation energy for oxidation of SN282 is 107 +/- 5 kJ/mol K, suggesting inward diffusion of molecular oxygen in the oxide layer as the rate-limiting mechanism.
机译:在930-1200摄氏度下在干燥的氧气中氧化了用5.35 wt%Lu2O3烧结的Kyocera SN282氮化硅陶瓷。SN282的氧化遵循抛物线速率定律。与含有其他烧结添加剂的氮化硅在相似条件下相比,SN282的抛物线速率常数低得多,氧化物形态稳定性更好。 SN282的氧化活化能为107 +/- 5 kJ / mol K,表明分子氧在氧化层中向内扩散是限速机制。

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