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首页> 外文期刊>Journal of Materials Processing Technology >Lapping and polishing process for obtaining super-smooth surfaces of quartz crystal
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Lapping and polishing process for obtaining super-smooth surfaces of quartz crystal

机译:研磨和抛光工艺以获得石英晶体的超光滑表面

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摘要

The lapping and polishing processes to obtain the damage-free surfaces and A level surface roughness of quartz crystal is discussed and realized by adopting soft material polishers, fine abrasive powders, and suitable working environments, by taking account of the minimization of mechanical actions in polishing process. The material removal mechism in the process of ultra-precision polishing is discussed, and the basic formation models of surface roughness are also put forward. A super-smooth surface of quartz crystal with 1-2 A level roughness have been obtained by adopting the SiO_2 abrasive powders and the K3 pitch polisher in the experiments.
机译:讨论并通过采用软质材料抛光机,细磨料粉和合适的工作环境,并考虑到抛光中的机械作用的最小化,来实现获得石英晶体无损伤表面和A级表面粗糙度的研磨和抛光工艺处理。讨论了超精密抛光过程中的材料去除机理,并提出了表面粗糙度的基本形成模型。通过在实验中采用SiO_2研磨粉和K3沥青抛光剂,获得了具有1-2 A级粗糙度的石英晶体超光滑表面。

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