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Micro arc oxidation of S-containing TiO{sub}2 films by sulfur bearing electrolytes

机译:含硫电解质对含硫TiO {sub} 2薄膜的微弧氧化

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Porous S-containing titania (TiO{sub}2) films were fabricated by micro arc oxidation (MAO) in sulfur bearing electrolytes. Two kinds of electrolytes, Na{sub}2SO{sub}3 solution and Na{sub}2S{sub}2O{sub}3 solution, were used in the experiment. The influence of electrolyte and applied voltage on the structure and surface morphology of prepared TiO{sub}2 films has been evaluated. The critical voltage for film generation is 150 V in Na{sub}2SO{sub}3 solution and 100 V in Na{sub}2S{sub}2O{sub}3 solution. Under applied voltage of 250 V, the thickness of the TiO{sub}2 film is 15μm for Na{sub}2SO{sub}3 electrolyte and 25μm for Na{sub}2S{sub}2O{sub}3 electrolyte, respectively. The films were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM) later. Two main phases, anatase and rutile, are contained in the porous film. Detailed reaction mechanism of MAO process was discussed later, and it is concluded that TiO{sub}2 films are more easily prepared in Na{sub}2S{sub}2O{sub}3 solution due to sulfur deposition.
机译:通过微弧氧化(MAO)在含硫的电解质中制备了含S的多孔二氧化钛(TiO {sub} 2)薄膜。实验中使用了两种电解质:Na {sub} 2SO {sub} 3溶液和Na {sub} 2S {sub} 2O {sub} 3溶液。评估了电解质和施加电压对制备的TiO {sub} 2薄膜的结构和表面形态的影响。成膜的临界电压在Na {sub} 2SO {sub} 3溶液中为150 V,在Na {sub} 2S {sub} 2O {sub} 3溶液中为100V。在250 V的施加电压下,对于Na {sub} 2SO {sub} 3电解质,TiO {sub} 2膜的厚度分别为15μm,对于Na {sub} 2S {sub} 2O {sub} 3电解质,其厚度分别为25μm。随后通过X射线衍射(XRD)和扫描电子显微镜(SEM)对膜进行表征。多孔膜中包含两个主要相,锐钛矿相和金红石相。稍后将讨论MAO工艺的详细反应机理,并得出结论:由于硫的沉积,在Na {sub} 2S {sub} 2O {sub} 3溶液中更容易制备TiO {sub} 2薄膜。

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