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Thermo-mechanical Degradation of NiCr Thin Film Subjected to Thermal Cycling

机译:热循环作用下NiCr薄膜的热机械降解

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The thermo-mechanical degradation of NiCr films during thermal cycling was investigated in terms of microstructural and chemical changes to the surface. Thermal cycling was performed between room temperature and 200°C in thermally evaporated NiCr films on an Mn-Ni-Co-O substrate. Isothermal exposures were also performed as a control experiment. The sheet resistance of the NiCr films increased linearly (from 35 to 52 Ω/sq.) with a temperature difference of the thermal cycling, whereas the films subjected to isothermal aging increased only slightly, from 35 to 38 Ω/sq, After 300 thermal cycles at AT=175°C, cracks formed and proliferated on the coating surface, and local delamination occurred at the interfaces. XPS results showed that the intensity of a metallic peak at 574.0 eV decreased and that of the Cr oxide peak at ~577 eV increased with an increase of the thermal cycles. Consequently, the degradation of the NiCr films by accelerated thermal cycling stress was attributed to a proliferation of lateral surface cracks from thermally induced tensile stress compounded by surface oxidation, causing an increase in sheet resistance.
机译:根据表面的微观结构和化学变化,研究了NiCr膜在热循环过程中的热机械降解。在Mn-Ni-Co-O基板上的热蒸发NiCr膜中,在室温至200°C之间进行热循环。还进行了等温暴露作为对照实验。 NiCr薄膜的薄层电阻随热循环的温差线性增加(从35Ω/ sq。到52Ω/ sq。),而经过300次热老化后,等温老化的薄膜仅从35Ω/ sq到38Ω/ sq稍微增加在AT = 175°C下循环,涂层表面形成裂纹并扩散,界面处发生局部分层。 XPS结果显示,随着热循环的增加,在574.0 eV处的金属峰强度降低,在〜577 eV处的氧化铬峰强度升高。因此,由于加速的热循环应力而导致的NiCr膜的劣化归因于由表面诱​​导的复合引起的热拉伸应力引起的侧面裂纹的扩散,从而导致薄层电阻的增加。

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