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Preparation of High Purity Si Powder from SiO_2 by Self- Propagating High-Temperature Synthesis Process

机译:自蔓延高温合成法制备SiO_2制高纯硅粉。

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The high purity Si powder was prepared by Self-propagatingHigh-temperature Synthesis(SHS) process from a mixture of SiO_2 and Mg asraw materials. The effect of the processing parameters on the characteristics ofthe product such as molar ratio, particle size, compaction pressure andleaching conditions were studied. In the case of 20-60 mesh of Mg particlesize, the complete reduction of 5i02 required excess magnesium, 2.6 mole,whereas unreacted SiO_2 was completely eliminated with stoichiometricmolar ratio, 2.0 mole of 140-200 mesh Mg powder. As the Mg particle sizewas decreased, the combustion temperature increased and the particle size ofthe product decreased. The concurrently formed MgO in the product wasleached with an diluted HC1 solution at 70deg C for 3 hours. The productsilicon had a purity of 99.88 percent which was higher than that of the reactantSiO_2. This is because the impurities were either volatilized at the hightemperature generated during the rapid exothermic reaction or dissolved intothe HCl solution during leaching.
机译:通过自蔓延高温合成(SHS)工艺,由SiO_2和Mg原料的混合物制备了高纯度Si粉。研究了工艺参数对产物特性的影响,如摩尔比,粒径,压实压力和浸出条件。在20-60目Mg粒度的情况下,5iO 2的完全还原需要过量的2.6摩尔镁,而以化学计量摩尔比2.0摩尔的140-200目Mg粉末完全消除了未反应的SiO 2。随着Mg粒径的减小,燃烧温度升高并且产物的粒径减小。将产物中同时形成的MgO用稀释的HCl溶液在70°C下淋洗3小时。产物硅的纯度为99.88%,高于反应物SiO_2的纯度。这是因为杂质在快速放热反应过程中产生的高温下挥发掉,或者在浸出过程中溶解到HCl溶液中。

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