A study on the synthesis and adhesion properties of WC films with various bias voltage

摘要

WC mono- and multilayer films were deposited onSTD61 and cemented carbide substrates by Cathodic Arc IonPlating process in various bias voltages of 0V to 200V. Chemicalcompositions and deposition rates were investigated using EnergyDispersive Spectroscopy(EDS) and Scanning ElectronMicroscopy(SEM). Microstructures of WC films were analyzed byX-ray Diffractometer(XRD). The adhesion and microhardnesswere evaluated by Rockwell-C indentation test method, Scratchtest and Microknoop hardness test. The films were formed in amixture of #alpha#-W_2C(hexagonal structure) and #beta#-WC(B1 NaCl structure) phase and the preferential orientation of#beta#-WC have been changed from [311] to [220] withincreasing bias voltage. The microhardness of the deposited WCfilms on cemented carbide were evaluated up to Hk3OOO and WCmultilayer films exhibited good adhesion in Rockwell-Cindentation test and Scratch test.