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Influential Factors of Low-energy C_(36)ter Deposition on Diamond(100)Crystal Plane

机译:低能C_(36)ter沉积在金刚石(100)晶面上的影响因素

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摘要

Brenner-LJ potential is adopted to describe the interactivity between diamond and C_(36)cluster,and the deposition mechanism of multi-C36 on the diamond surface is researched by molecular dynamics simulation.Through simulative experiments the incident energy,incident point,incident posture,incident angle and other factors are analyzed.Studies discover that the minimal deposition threshold is 20 eV and the maximum is 60 eV with the different incident point locations and incident postures of C_(36)clusters.When the incident angle is not over 60°,C_(36)may roll or slip to the region of smaller bonding energy and then bond.So the bonding probability is raised.Research results show that when incident angle is between 0° and 20° and incident energy range is from 30 eV to 60 eV,it is the optimal condition of single C_(36)cluster deposition on diamond(100)crystal plane.
机译:采用Brenner-LJ势能描述金刚石与C_(36)团簇的相互作用,并通过分子动力学模拟研究多C36在金刚石表面的沉积机理。通过模拟实验,研究了入射能,入射点,入射姿态研究发现,在C_(36)团簇的不同入射点位置和入射姿态下,最小沉积阈值为20 eV,最大沉积阈值为60 eV。当入射角不超过60°时C_(36)可能滚动或滑至键合能较小的区域然后键合,因此键合概率增加。研究结果表明,当入射角在0°至20°之间且入射能范围为30 eV至60 eV是金刚石(100)晶面上单C_(36)团簇沉积的最佳条件。

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