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Electrodeposition of Copper on a Copper Single Crystal (110) Plane in the Presence of Bromide Ions and Growth Similarity of (100) and (111) Planes in the Presence of Chloride Ions

机译：在溴离子存在下在铜单晶（110）平面上的电沉积铜单晶（110）平面，在氯离子存在下（100）和（111）平面的生长相似性

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S. NAGESWAR;
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年度 1977
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1. Epitaxial electrodeposition of chiral CuO films from copper(II) complexes of malic acid on Cu(111) and Cu(110) single crystals [J] . Rakesh V. Gudavarthy, Niharika Burla, Elizabeth A. Kulp Journal of Materials Chemistry: An Interdisciplinary Journal dealing with Synthesis, Structures, Properties and Applications of Materials, Particulary Those Associated with Advanced Technology . 2011,第17期

机译：苹果酸铜（II）配合物在Cu（111）和Cu（110）单晶上的手性CuO薄膜的外延电沉积
2. Electrodeposition of polyphasic films of zinc oxi sulfide from DMSO onto n-InP(100) and n-InP(111) single crystals in the presence of zinc salt, thiourea, and dissolved molecular oxygen [J] . Henriquez R, Froment M, Riveros G, The journal of physical chemistry, C. Nanomaterials and interfaces . 2007,第16期

机译：在锌盐，硫脲和溶解的分子氧存在下，将DMSO中的氧化锌硫化物多相膜电沉积到n-InP（100）和n-InP（111）单晶上
3. Electrochemical reduction of CO_2 at copper single crystal Cu(S)-[n(111) * (111)] and Cu(S)-[n(110) * (100)] electrodes [J] . Ichiro Takahashi, Osamu Koga, Nagahiro Hoshi, Journal of Electroanalytical Chemistry: An International Journal Devoted to All Aspects of Electrode Kinetics, Interfacial Structure, Properties of Electrolytes, Colloid and Biological Electrochemistry . 2002,第1a2期

机译：铜单晶Cu（S）-[n（111）*（111）]和Cu（S）-[n（110）*（100）]电极上CO_2的电化学还原
4. Enehancement of ethylene formation in electrochemical reduction of CO_2 at copper single crystal electrodes by introduction of step atoms to(100)basal plane [C] . Y.Hori, I.Takahashi, O.Koga The Meeting of the Electrochemical Society . 2001

机译：通过将步骤原子引入（100）基平面，通过将步骤原子引入铜单晶电极CO_2电化学缩小的乙烯形成。
5. Low -energy electron diffraction study of iron epitaxially -grown on copper(100), copper(111) and copper(110) [D] . Marcano, Jesus Maria. 1988

机译：铁在铜（100），铜（111）和铜（110）上外延生长的低能电子衍射研究
6. Survival and Growth in the Presence of Elevated Copper: Transcriptional Profiling of Copper-Stressed Pseudomonas aeruginosa [O] . Gail M. Teitzel, Ashley Geddie, Susan K. De Long, 2006

机译：铜含量较高时的存活和生长：铜胁迫的铜绿假单胞菌的转录谱分析
7. Electrodeposition of copper on copper single crystal (100), (110) and (111) planes in presence of Thiosemicarbazide [O] . Sheshadri B.S., Setty T.H.V. 1972

机译：在硫代氨基脲存在下在铜单晶（100），（110）和（111）平面上电沉积铜
8. Induced Adsorption of Chloride and Bromide by Submonolayer Amounts of Copper Underpotentially Deposited on Pt(111). [R] . Gomez, R., Feliu, J. M., Abruna, H. D. 1994

机译：pt（111）沉积下亚单层铜诱导氯离子和溴化物的吸附。

Electrodeposition of Copper on a Copper Single Crystal (110) Plane in the Presence of Bromide Ions and Growth Similarity of (100) and (111) Planes in the Presence of Chloride Ions

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