In Situ Particle Removal Studies using an Optical Particle

摘要

The removal of particles is considered to be a three-step process (see Figure 1). Physical and chemical parameters, such as temperature, viscosity, pH, and presence of surfactants can impact each step differently The first step (Ea) is the detachment of the particle from the surface, which brings the particle in the boundary layer. The Boundary layer , Bulk liquid second step (kb) is the diffusion of the particle through the boundary layer into the bulk of the process liquids. If this does not occur before the wafer is dried, the particle will redeposit on the wafer surface. Finally, the particle has to be carried away from the wafer environment (&c) by filtration or draining of the contaminated process Silicon wafer liquid.