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Cathodo- and photoluminescence increase in amorphous hafnium oxide under annealing in oxygen

机译:氧退火下非晶氧化oxide的阴极发光和光致发光增加

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Cathodo- and photoluminescence of amorphous nonstoichiometric films of hafnium oxide are studied with the aim to verify the hypothesis that oxygen vacancies are responsible for the luminescence. To produce oxygen vacancies, hafnium oxide was enriched in surplus metal during synthesis. To reduce the oxygen concentration, the film was annealed in oxygen. A qualitative control of the oxygen concentration was carried out by the refractive index. In the initial, almost stoichiometric films we observed a 2.7-eV band in cathodoluminescence. Annealing in oxygen results in a considerable increase in its intensity, as well as in the appearance of new bands at 1.87, 2.14, 3.40, and 3.6 eV. The observed emission bands are supposed to be due to single oxygen vacancies and polyvacancies in hafnium oxide. The luminescence increase under annealing in an oxygen atmosphere may be a result of the emission quenching effect.
机译:研究了氧化non的非晶非化学计量薄膜的阴极发光和光致发光,目的是验证氧空位是造成发光的假设。为了产生氧空位,在合成过程中将氧化ha富集了多余的金属。为了降低氧浓度,将膜在氧中退火。通过折射率对氧浓度进行定性控制。在最初的几乎化学计量的薄膜中,我们在阴极发光中观察到2.7 eV的能带。氧气退火导致其强度显着提高,并出现了1.87、2.14、3.40和3.6 eV的新谱带。观察到的发射带应该归因于氧化ha中的单个氧空位和多空位。在氧气氛中退火下的发光增加可能是发射猝灭效应的结果。

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