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首页> 外文期刊>Journal of Electronic Materials >Electron-Electron Interactions in Sb-Doped SnO_(2) Thin Films
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Electron-Electron Interactions in Sb-Doped SnO_(2) Thin Films

机译:掺锑的SnO_(2)薄膜中的电子相互作用

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Electrical conductivity and Hall-effect measurements on undoped and Sb-doped SnO_(2) thin films prepared by the sol-gel technique were carried out as a function of temperature (55 K to 300 K). Structural characterizations of the films were performed by atomic force microscopy (AFM) and x-ray diffraction (XRD). A doping-induced metal-insulator transition (MIT) was observed. On the metallic side of the transition, the experimental data were interpreted in terms of electron-electron interactions (EEI). The existence of EEI was confirmed by excellent agreement between theoretical and experimental data. The experimental data on the insulator side of the transition were analyzed in terms of variable-range hopping (VRH) conduction. A complete set of parameters describing the properties of the localized electrons, including hopping energy, hopping distance, and the value of the density of states at the Fermi level, was determined.
机译:根据温度(55 K至300 K)对通过溶胶凝胶技术制备的未掺杂和掺Sb的SnO_(2)薄膜进行电导率和霍尔效应测量。膜的结构表征通过原子力显微镜(AFM)和X射线衍射(XRD)进行。观察到掺杂诱导的金属-绝缘体转变(MIT)。在过渡的金属方面,根据电子-电子相互作用(EEI)解释了实验数据。理论和实验数据之间的高度吻合证实了EEI的存在。根据变程跳变(VRH)传导分析了过渡区绝缘子侧的实验数据。确定了描述局部电子特性的完整参数集,包括跳变能量,跳变距离和费米能级的状态密度值。

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