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Effect of Deposition Temperature on the Properties of CdTe Thin Films Prepared by Close-Spaced Sublimation

机译:沉积温度对近距离升华制备的CdTe薄膜性能的影响

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CdTe films have been prepared by close-spaced sublimation under different conditions. When CdTe is deposited at a low temperature, grains with a single predominant growth plane (111) adhere to the substrate and gather into scattered particles. With increasing deposition temperature, the number of CdTe grains on the substrate increases very quickly, the grains begin to form a quasi-continuous film, and (220), (311), (400), and (331) growth planes of CdTe begin to appear. When the deposition temperature and time are increased further, the CdTe grains begin to accumulate, the pin-holes formed initially begin to disappear, and grain boundaries with traces of layer growth can be observed. Different transmittance of samples of different thickness is clearly apparent but changes of the band gap, E (g), of the CdTe films is negligible. XPS results suggest CdTeO3 is generated on the CdTe film surface as the deposition time is increased.
机译:通过在不同条件下进行近距离升华可以制备CdTe薄膜。当在低温下沉积CdTe时,具有单个主要生长平面(111)的晶粒会粘附到基材上并聚集成散布的颗粒。随着沉积温度的升高,基板上CdTe晶粒的数量非常快地增加,这些晶粒开始形成准连续膜,并且CdTe的(220),(311),(400)和(331)生长平面开始出现。当沉积温度和时间进一步增加时,CdTe晶粒开始堆积,最初形成的针孔开始消失,并且可以观察到具有层生长痕迹的晶界。不同厚度样品的不同透射率显而易见,但CdTe薄膜的带隙E(g)的变化可以忽略不计。 XPS结果表明,随着沉积时间的增加,CdTeO3会在CdTe膜表面生成。

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