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首页> 外文期刊>Journal of Electronic Materials >Improvement of Thermoelectric Properties in (Bi0.5Sb0.5)(2)Te-3 Films of Nanolayered Pillar Arrays
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Improvement of Thermoelectric Properties in (Bi0.5Sb0.5)(2)Te-3 Films of Nanolayered Pillar Arrays

机译:纳米柱阵列的(Bi0.5Sb0.5)(2)Te-3薄膜的热电性能的改善

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摘要

In this work, it is found that unique pillar arrays with nanolayered structure can favorably influence the carrier and phonon transport properties of films. p-(Bi0.5Sb0.5)(2)Te-3 pillar array film with (0 1 5) orientation was successfully achieved by a simple ion-beam-assisted technique at deposition temperature of 400A degrees C, owing to the enhanced mobility of deposited atoms for more sufficient growth along the in-plane direction. The pillar diameter was about 250 nm, and the layered nanostructure was clear, with each layer in the pillar array being < 30 nm. The properties of the oriented (Bi0.5Sb0.5)(2)Te-3 pillar array were greatly enhanced in comparison with those of ordinary polycrystalline films synthesized at deposition temperature of 350A degrees C and 250A degrees C. The (Bi0.5Sb0.5)(2)Te-3 pillar array film with (0 1 5) preferred orientation exhibited a thermoelectric dimensionless figure of merit of ZT = 1.25 at room temperature. The unique pillar array with nanolayered structure is the main reason for the observed improvement in the properties of the (Bi0.5Sb0.5)(2)Te-3 film.
机译:在这项工作中,发现具有纳米层结构的独特柱状阵列可以有利地影响薄膜的载流子和声子传输性质。通过简单的离子束辅助技术在400A的沉积温度下成功地获得了具有(0 1 5)取向的p-(Bi0.5Sb0.5)(2)Te-3柱阵列膜,这是由于其迁移率提高了沉积原子的数量,以便沿面内方向更充分地生长。柱直径为约250nm,并且层状纳米结构是透明的,柱阵列中的每一层<30nm。与在350A摄氏度和250A摄氏度的沉积温度下合成的普通多晶薄膜相比,定向(Bi0.5Sb0.5)(2)Te-3柱阵列的性能大大提高。(Bi0.5Sb0。具有(0 1 5)优选取向的5)(2)Te-3柱阵列膜在室温下表现出ZT = 1.25的热电无因次品质因数。观察到的(Bi0.5Sb0.5)(2)Te-3薄膜性能改善的主要原因是具有纳米层结构的独特柱阵列。

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