Chemical development of preceramic polyvinylsilazane photoresist for ceramic patterning

摘要

In order to develop a preceramic photoresist for the fabrication of non-oxide SiCN ceramic micro-structures by a mold-free photocuring shaping process, UV sensitive acrylate functional groups were successfully grafted onto the backbone of polyvinylsilazane by its reaction with ethyl-4-bromocrotonate via a high efficiency allyl bromide electrophilic substitution process. The as-modified polymer was characterized by ~1H Nuclear Magnetic Resonance ~1H-NMR) and 2D-~1H-~1H-NMR (COSY) spectroscopy, and its UV sensitivity was investigated by Differential PhotoCalorimetry (DPC) and Fourier Transform InfraRed (FT-IR) spectroscopy. The reaction mechanism was discussed in detail and the results showed that the as-modified polyvinylsilazane (m-PVSZ) is a promising preceramic photoresist.