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Electrodeposition of soft-magnetic cobalt-molybdenum coatings containing low molybdenum percentages

机译:钼含量低的软磁钴钼涂层的电沉积

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摘要

Electrodeposition of cobalt-molybdenum alloys has been optimised to obtain coatings that show low coercivity and high saturation magnetisation. For this purpose, low molybdenum percentages were required (less than or equal to 10%). Solutions containing a fixed sodium citrate concentration (0.2 mol dm(-3)) and variable concentrations of CoSO4 and Na2MoO4 were tested. 0.1 mol dm(-3) CoSO4 + 0.005 mol dm(-3) Na2MoO4 or 0.3 mol dm(-3) CoSO4 + 0.012 mol dm(-3) Na2MoO4 solutions, both at pH 4, were useful to obtain Co-Mo coatings of several microns with a molybdenum percentage less than or equal to 10%, although higher process efficiency was obtained from the second solution. These coatings showed a fluffy morphology and a close-packed hexagonal structure (hcp) with (1 1 0) + (1 0 0) preferred orientation. These films exhibited a soft magnetic behaviour and their coercivity (H-c) was clearly lower than that corresponding to pure-cobalt deposits and they maintained, moreover, high saturation magnetisation (M-s). (C) 2004 Published by Elsevier B.V.
机译:已对钴钼合金的电沉积进行了优化,以获得具有低矫顽力和高饱和磁化强度的涂层。为此,需要低的钼百分比(小于或等于10%)。测试了包含固定浓度柠檬酸钠(0.2 mol dm(-3))和可变浓度的CoSO4和Na2MoO4的溶液。 pH值为4的0.1 mol dm(-3)CoSO4 + 0.005 mol dm(-3)Na2MoO4或0.3 mol dm(-3)CoSO4 + 0.012 mol dm(-3)Na2MoO4溶液(pH 4)均可用于获得Co-Mo涂层尽管从第二种溶液获得了更高的工艺效率,但是钼的百分含量小于或等于10%。这些涂层显示出蓬松的形态和紧密堆积的六方结构(hcp),其首选取向为(1 1 0)+(1 0 0)。这些膜表现出软磁行为,并且其矫顽力(H-c)明显低于对应于纯钴沉积的矫顽力(H-c),而且它们还保持了高饱和磁化强度(M-s)。 (C)2004由Elsevier B.V.发布

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